Ecole Doctorale des Sciences

Pulsed Magnetron Sputtering – Process Overview and Applications

Prof. Peter Kelly

Surface Engineering Group,

Manchester Metropolitan University, UK

Jeudi 25 Juin 2009, 14h30

The introduction of pulsed magnetron sputtering in the mid-90s initiated a new and exciting era in surface engineering technologies, which is still continuing to develop. Pulsed sputtering transformed the deposition of ‘difficult’ materials, particularly dielectrics such as alumina, titania and silica. When sputtering in the mid-frequency range (20-350 kHz), the periodic target voltage reversals suppress arc formation at the target (a major problem during the deposition of dielectrics) and provide long-term process stability. Thus, high quality, defect-free coatings of these materials can now be deposited at competitive rates.

However, pulsing the magnetron discharge in this frequency range also strongly modifies the deposition plasma; raising the time averaged electron temperature and the energy flux delivered to the substrate, in comparison with continuous DC processing. These advantageous deposition conditions have been exploited in the deposition of materials, such as titanium nitride, where arcing is not considered a problem. In this case, coatings deposited by pulsed processing demonstrated enhanced structures and tribological properties in comparison with conventional coatings. This technique has also been used to sputter blended powder targets, allowing for example dopant materials and concentrations in transparent conductive oxides, to be efficiently investigated.

This presentation will give an overview of the pulsed magnetron sputtering process (pulsed DC and mid-frequency AC), briefly describe the underlying plasma physics, give examples of successful applications of this technology and consider applications of the recently introduced high power impulse pulsed magnetron sputtering (HIPIMS) technique.

Informations complémentaires :

Prof. Rony Snyders

Académie Universitaire Wallonie-Bruxelles

Laboratoire de Chimie Inorganique et Analytique, LCIA - Université de Mons-Hainaut, UMH

1, Avenue Copernic, 7000 Mons, Belgium

Tel: 32(0)65373855, Fax: 32(0)65373841